Title:
A method, an inspection device, and a device manufacturing method which determine a critical dimension related characteristic
Document Type and Number:
Japanese Patent JP6251386
Kind Code:
B2
Abstract:
A method of determining a critical-dimension-related property, such as critical dimension (CD) or exposure dose, includes illuminating each of a plurality of periodic targets having different respective critical dimension biases, measuring intensity of radiation scattered by the targets, recognizing and extracting each grating from the image, determining a differential signal, and determining the CD-related property based on the differential signal, the CD biases and knowledge that the differential signal approximates to zero at a 1:1 line-to-space ratio of such periodic targets. Use of the determined CD-related property to control a lithography apparatus in lithographic processing of subsequent substrates. In order to use just two CD biases, a calibration may use measurements on a “golden wafer” (i.e. a reference substrate) to determine the intensity gradient for each of the CD pairs, with known CDs. Alternatively, the calibration can be based upon simulation of the sensitivity of intensity gradient to CD.
Inventors:
Cramel, Fugo
Den bouff, allie, jeffrey
Henryus, Megens
Van der Char, Maurits
Hwang
Den bouff, allie, jeffrey
Henryus, Megens
Van der Char, Maurits
Hwang
Application Number:
JP2016518897A
Publication Date:
December 20, 2017
Filing Date:
May 23, 2014
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G01B11/00; G03F7/20; G01N21/956
Domestic Patent References:
| JP2006515958A | ||||
| JP2007522432A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
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