Title:
基板から皮膜を除去する方法およびそれに用いる組成物
Document Type and Number:
Japanese Patent JP4731049
Kind Code:
B2
Abstract:
A method for selectively removing one or more coatings from the surface of a substrate is described. The coating is treated with an aqueous composition which includes an acid of the formula HxAF6, or precursors to such an acid. In that formula, A is Si, Ge, Ti, Zr, Al, and Ga; and x is 1-6. The acid is often H2SiF6. The composition may sometimes include at least one additional acid, such as phosphoric acid. The coating being removed is often an aluminide coating or an MCrAl(X)-type material. The substrate is usually a polymer or a metal, such as a superalloy.
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Inventors:
Lawrence Bernard Cool
John Robert Ragraph
James Anthony Rude
John Robert Ragraph
James Anthony Rude
Application Number:
JP2001173362A
Publication Date:
July 20, 2011
Filing Date:
June 08, 2001
Export Citation:
Assignee:
GENERAL ELECTRIC COMPANY
International Classes:
C23F1/20; F01D5/28; C22C19/00; C23F1/00; C23F1/28; C23F1/44; F01D5/00; F01D25/00; F02C7/00
Domestic Patent References:
| JP10081980A | ||||
| JP10072685A | ||||
| JP9324278A | ||||
| JP11106970A |
Attorney, Agent or Firm:
Arakawa Satoshi