Title:
A new onium salt compound, a resist composition, and a pattern formation method
Document Type and Number:
Japanese Patent JP6217561
Kind Code:
B2
Abstract:
Sulfonium and iodonium salts of nitrogen-containing carboxylic acids are novel. The onium salt functions as an acid diffusion controlling agent in a resist composition, enabling to form a pattern of good profile with high resolution, improved MEF, LWR and DOF.
Inventors:
Masaki Ohashi
Jun Hatakeyama
Fukushima
Jun Hatakeyama
Fukushima
Application Number:
JP2014168165A
Publication Date:
October 25, 2017
Filing Date:
August 21, 2014
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07D209/42; C07C381/12; C07D209/08; C07D209/18; C07D217/26; C07D231/56; C07D235/06; C07D249/18; C09K3/00; G03F7/004; G03F7/038; G03F7/039
Domestic Patent References:
| JP2008013705A | ||||
| JP2012242657A | ||||
| JP2013092598A | ||||
| JP2007293250A | ||||
| JP2011048289A | ||||
| JP2011197464A |
Other References:
He, Jun-Hui et al.,Sensitized Photolysis of Diphenyliodonium Cation Through Intra-Ion-Pair Electron Transfer-A Novel Near-UV Photoinitiator: Diphenyliodonium 9-Acridinecarboxylate,Journal of Polymer Science, Part A: Polymer Chemistry,1999年,37(24),pp. 4521-4527
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki
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