Title:
Optical system with EUV mirror and EUV mirror
Document Type and Number:
Japanese Patent JP6351625
Kind Code:
B2
Abstract:
An EUV mirror with a substrate and a multilayer arrangement including: a periodic first layer group having N1>1 first layer pairs of period thickness P1 and arranged on a radiation entrance side of the multilayer arrangement; a periodic second layer group having N2>1 second layer pairs of period thickness P2 and arranged between the first layer group and the substrate; and a third layer group having N3 third layer pairs arranged between the first and second layer groups. N1>N2. The third layer group has a third period thickness P3 which deviates from an average period thickness PM=(P1+P2)/2 by a period thickness difference ΔP. ΔP corresponds to the quotient of the optical layer thickness (λ/4) of a quarter-wave layer and the product of N3 and cos(AOIM), AOIM being the mean incidence angle for which the multilayer arrangement is designed.
Inventors:
Thomas Sicketants
Hans-Jochen Paul
Christoph Tsazek
Hans-Jochen Paul
Christoph Tsazek
Application Number:
JP2015552015A
Publication Date:
July 04, 2018
Filing Date:
December 06, 2013
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B5/08; G02B5/10; G02B17/08; G02B19/00; G21K1/06
Domestic Patent References:
| JP2001051106A |
Foreign References:
| WO2005038886A1 | ||||
| WO2004109778A1 | ||||
| US6449086 |
Other References:
THOMAS KUHLMANN ET AL,EUV multilayer mirrors with tailored spectral reflectivity,PROCEEDINGS 0F SPIE,米国,2002年12月 1日,vol. 4782,,196-203
Attorney, Agent or Firm:
Kenji Sugimura
Hitomi Yuki
Koichiro God
Hitomi Yuki
Koichiro God