Title:
Phase shift mask blank and its manufacturing method, phase shift mask manufacturing method, and display device manufacturing method
Document Type and Number:
Japanese Patent JP6324756
Kind Code:
B2
Abstract:
The present invention is to provide a phase-shift mask blank for manufacturing a display device, which may be formed into a cross-sectional shape, for effectively expressing a phase effect by wet etching. The phase-shift mask blank comprises: a transparent substrate (21); a light semi-transmissive film (22) formed on a main surface of the transparent substrate (21), having a property of changing a phase of light of a representative wavelength included in exposure light by approximately 180 degrees, and containing a chromium-based material; and an etching mask film (23) made of a metal silicide-based material formed on the light semi-transmissive film (22).
Inventors:
Seiji Tsuboi
Ushida Masao
Ushida Masao
Application Number:
JP2014038329A
Publication Date:
May 16, 2018
Filing Date:
February 28, 2014
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/32
Domestic Patent References:
| JP8076353A | ||||
| JP7043888A | ||||
| JP2198835A | ||||
| JP8123010A | ||||
| JP2011013382A | ||||
| JP2011013283A | ||||
| JP2007271720A | ||||
| JP2001174973A | ||||
| JP2001147516A |
Attorney, Agent or Firm:
Hiroshi Oshino
Takafumi Oshima
Takafumi Oshima