Title:
位相シフトマスクブランクおよびこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法
Document Type and Number:
Japanese Patent JP6891099
Kind Code:
B2
Abstract:
Provided is a phase shift mask blank for forming a phase shift mask for a display device, said phase shift mask having an excellent pattern cross-sectional shape and excellent CD uniformity, and having a fine pattern formed thereon, thereby improving transfer accuracy. The phase shift mask blank is provided with a phase shift film on a transparent substrate, the phase shift film is composed of a metal-based material or a metal silicide-based material, and the phase shift film comprises a phase shift layer, an antireflection layer arranged on the upper side of the phase shift layer, and an intermediate layer arranged between the phase shift layer and the antireflection layer. The intermediate layer is a metal-based material having a metal content higher than the metal content of the antireflection layer, or a metal silicide-based material having a total content higher than the total content of the metal and silicon in the antireflection layer, and the film surface reflectance of the phase shift film is 15% or less in the wavelength range of 350-436 nm. The phase shift film has a back surface reflectance of 20% or less with respect to light incident from the transparent substrate side in a wavelength range of 365 nm to 436 nm.
More Like This:
Inventors:
Seiji Tsuboi
Junichi Yasumori
Junichi Yasumori
Application Number:
JP2017230282A
Publication Date:
June 18, 2021
Filing Date:
November 30, 2017
Export Citation:
Assignee:
HOYA CORPORATION
International Classes:
G03F1/32; C23C14/06; G03F1/54; G03F1/58
Domestic Patent References:
| JP6342205A | ||||
| JP2005128278A | ||||
| JP2000181049A | ||||
| JP2003322947A | ||||
| JP2005092241A | ||||
| JP2010078923A | ||||
| JP2014197217A | ||||
| JP2007183453A | ||||
| JP2017010059A |
Foreign References:
| US6764792 | ||||
| US6500587 |
Attorney, Agent or Firm:
Yutaka Nagata
Takafumi Oshima
Tsukasa Ota
Takafumi Oshima
Tsukasa Ota