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Title:
光酸発生剤、レジスト組成物、及び、該レジスト組成物を用いたデバイスの製造方法
Document Type and Number:
Japanese Patent JP7091063
Kind Code:
B2
Abstract:
To provide a compound suitable to be used for a resist composition that has high sensitivity to active energy, shows excellent resolution and depth of focus in lithography, and can reduce line edge roughness in a fine pattern.SOLUTION: A compound represented by formula (1) below is provided. In the formula, R represents one of a linear hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, branched hydrocarbon group having 3 to 30 carbon atoms, cyclic hydrocarbon group having 3 to 30 carbon atoms, aryl group having 5 to 30 carbon atoms, and heteroaryl group having 3 to 30 carbon atoms; X represents a divalent connecting group; Mrepresents a monovalent cation; and at least one of H atoms possessed by the above linear hydrocarbon group, branched hydrocarbon group, cyclic hydrocarbon group, aryl group and heteroaryl group is replaced by a monovalent polar group having at least one O, and/or at least one of methylene groups possessed by the above linear hydrocarbon group, branched hydrocarbon group and cyclic hydrocarbon group is replaced by a divalent polar group having at least one O.SELECTED DRAWING: None

Inventors:
Nobuaki Kobayashi
Yoshiyuki Utsumi
Application Number:
JP2017239829A
Publication Date:
June 27, 2022
Filing Date:
December 14, 2017
Export Citation:
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Assignee:
Toyo Gosei Co., Ltd.
International Classes:
C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
JP2013114085A
JP2018138541A
JP2003327572A
Foreign References:
WO2015025859A1
Attorney, Agent or Firm:
SK Patent Attorney Corporation
Akihiko Okuno
Hiroyuki Ito