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Title:
A photocatalyst, its manufacturing method, and a purifying facility
Document Type and Number:
Japanese Patent JP6009254
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a photocatalyst which can absorb visible light satisfactorily and exhibits high photocatalytic activity.SOLUTION: The photocatalyst includes a photocatalyst part comprising a semiconductor having 2.0 or higher refractive index and a plurality of metal nanoparticles each of which contacts with the semiconductor and is formed to be encircled by the semiconductor. The photocatalyst is characterized in that 50% or more of metal atoms in the photocatalyst, each of which constitutes the metal nanoparticle, are distributed in a zone being at the depth of 25 nm or longer from the surface of the photocatalyst part.

Inventors:
Nobuyoshi Senrai
Application Number:
JP2012158635A
Publication Date:
October 19, 2016
Filing Date:
July 17, 2012
Export Citation:
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Assignee:
Sharp Corporation
International Classes:
B01J35/02; B01F3/04; B01F5/00; B01F5/06; B01J23/50; B01J23/52; B01J23/72; B01J37/00; C02F1/30; C02F1/72; C02F1/74; C02F1/78
Domestic Patent References:
JP2000037615A
JP2011251269A
JP2009233635A
JP10168325A
JP2002143688A
JP11197512A
Foreign References:
WO2012141046A1
WO2008105295A1
Other References:
H. TSUJI et al.,Surface modification of TiO2 (rutile) by metal negative ion implantation for improving catalytic properties,Surface and Coatings Technology,2002年,158-159,208-213.,DOI: 10.1016/S0257-8972(02)00209-8
Attorney, Agent or Firm:
Shintaro Nogawa
Shinji Kai
Yusuke Kaneko
Kiyoshi Inamoto
Masami Tomita