Title:
酸不安定性ペンダント基を有する多環式ポリマーからなるフォトレジスト組成物
Document Type and Number:
Japanese Patent JP4416941
Kind Code:
B2
Abstract:
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
Inventors:
Brian El Goodall
Cyclomal Jayarman
Robert a chic
Larry F. Rhodes
Robert David Allen
Richard Anthony di Pietro
Thomas Warrow
Cyclomal Jayarman
Robert a chic
Larry F. Rhodes
Robert David Allen
Richard Anthony di Pietro
Thomas Warrow
Application Number:
JP2000512109A
Publication Date:
February 17, 2010
Filing Date:
September 03, 1998
Export Citation:
Assignee:
Sumitomo Bakelite Co., Ltd.
International Classes:
G03F7/004; G03F7/039; C08F2/46; C08F32/00; C08G61/08; G03C1/72
Domestic Patent References:
| JP10207058A | ||||
| JP10218947A | ||||
| JP10254140A | ||||
| JP10254139A | ||||
| JP10111569A | ||||
| JP3962432B2 | ||||
| JP2000508080A |
Attorney, Agent or Firm:
Kazuo Shamoto
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Takumi Terachi
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Takumi Terachi