Title:
A photoresist constituent and a resist pattern formation method
Document Type and Number:
Japanese Patent JP6079128
Kind Code:
B2
Inventors:
Ikui Junto
Application Number:
JP2012233826A
Publication Date:
February 15, 2017
Filing Date:
October 23, 2012
Export Citation:
Assignee:
JSR CORPORATION
International Classes:
G03F7/004; C07C303/28; C07C309/07; C07C309/12; C07C309/19; C07D207/416; C07D307/93; C07D307/94; C09K3/00; G03F7/039
Domestic Patent References:
| JP2011148774A | ||||
| JP2009024172A | ||||
| JP2009048182A | ||||
| JP2007052182A | ||||
| JP2010266755A | ||||
| JP2011178670A |
Foreign References:
| WO2012048447A1 | ||||
| US20090023093 |
Attorney, Agent or Firm:
Hajime Amano
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Yoshiaki Negi
Takashi Shinjo
Kazuya Kawabata
Takeshi Shibao
Yoshinori Ikeda
Hiroshi Ogawa
Koji Ishida
Kazuki Kagami
Yoshiaki Negi
Takashi Shinjo
Kazuya Kawabata
Takeshi Shibao
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