Title:
A photosensitive composition and a pattern formation method using it
Document Type and Number:
Japanese Patent JP5997873
Kind Code:
B2
Abstract:
A photosensitive composition comprises (A) a resin whose solubility in an alkali developer is increased by the action of an acid, and (B) a compound that generates an acid when exposed to actinic rays or radiation, wherein the resin (A) contains two or more repeating units respectively having acid-decomposable groups that are different from each other in the acid decomposition ratio at an image formation sensitivity.
Inventors:
Akinori Shibuya
Shirakawa Mitsuhiro
Shirakawa Mitsuhiro
Application Number:
JP2009140942A
Publication Date:
September 28, 2016
Filing Date:
June 12, 2009
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/039; C08F20/18; C08F20/56; H01L21/027
Domestic Patent References:
| JP2002372784A | ||||
| JP2005352466A | ||||
| JP2008209917A |
Foreign References:
| CN101206405A |
Attorney, Agent or Firm:
Kurata Masatoshi
Nobuhisa Nogawa
Takashi Mine
Naoki Kono
Katsu Sunagawa
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Nobuhisa Nogawa
Takashi Mine
Naoki Kono
Katsu Sunagawa
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi