Title:
フルオロ化されたエチレングリコール基を有する感光性ポリマー及びこれを含む化学増幅型レジスト組成物
Document Type and Number:
Japanese Patent JP4107946
Kind Code:
B2
Abstract:
A photosensitive polymer comprises a fluorinated ethylene glycol group and a chemically amplified resist composition including the photosensitive polymer. The photosensitive polymer has a weight average molecular weight of about 3,000-50,000 having a repeating unit as follows:wherein R1 is a hydrogen atom or methyl group, and R2 is a fluorinated ethylene glycol group having 3 to 10 carbon atoms.
Inventors:
Cui Ai Shun
Fumi Zhou
Common sense
Yun
Song Ki-ho
Fumi Zhou
Common sense
Yun
Song Ki-ho
Application Number:
JP2002324050A
Publication Date:
June 25, 2008
Filing Date:
November 07, 2002
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO.,LTD.
International Classes:
C08F220/22; C08F20/26; C08F212/14; C08F220/10; C08F220/42; C08F232/04; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP64024815A |
Other References:
Sh.Sh. Sharakhmedov, A.A. Yul'chibaev, F.M. Mukhametshin,`Copolymerization of fluorooxaalkyl acrylates with methyl methacrylate',Uzbekskii Khimicheskii Zhurnal,UZ,1990年 9月14日,No.3, 1990,pp.51-53,(ロシア語)
Attorney, Agent or Firm:
Mikio Hatta
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani
Atsushi Nogami
Yasuo Nara
Etsuko Saito
Katsuyuki Utani