Title:
A photosensitive resin composition, a pattern formation method, a color filter, and a display
Document Type and Number:
Japanese Patent JP6037708
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a pattern excellent in straight advancing property and adhesiveness with a small amount of exposure while containing a light shielding agent, and to provide a pattern forming method using the photosensitive resin composition, a color filter formed using the photosensitive resin composition, and a display device using the color filter.SOLUTION: A photosensitive resin composition contains a photopolymerizable compound, a photopolymerization initiator, a compound represented by formula (1), and a light shielding agent. In the formula, Rand Reach independently represent a hydrogen atom or an organic group, but at least one represents an organic group. Rand Rmay be linked with each other to form a cyclic structure, and may include a bond of hetero atoms. Rrepresents a single bond or an organic group. Rto Reach independently represent a hydrogen atom, an organic group or the like, but Rand Rare not a hydroxyl group. Rrepresents a hydrogen atom or an organic group.
Inventors:
Shioda Dai
Kuroko Mayumi
Kunihiro Noda
Tatsuro Ishikawa
Kuroko Mayumi
Kunihiro Noda
Tatsuro Ishikawa
Application Number:
JP2012174872A
Publication Date:
December 07, 2016
Filing Date:
August 07, 2012
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; C08F290/00; G02B5/20; G02B5/22; G03F7/027
Domestic Patent References:
| JP53090387A | ||||
| JP53065381A | ||||
| JP54061164A | ||||
| JP2004069754A | ||||
| JP2012093744A | ||||
| JP2012092328A | ||||
| JP2011095635A |
Foreign References:
| WO2012176693A1 | ||||
| WO2012176694A1 | ||||
| WO2010113813A1 |
Attorney, Agent or Firm:
Masayuki Masabayashi