Title:
A plasma source, the method of generating plasma, a plasma treatment system, and a plasma system
Document Type and Number:
Japanese Patent JP5989644
Kind Code:
B2
Abstract:
A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction. A system and method for generating a plasma are also described.
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Inventors:
Shazi Ali
Gotcho Richard
Benzeruk Suhail
Kaue Andrew
Nagarkati Ciders Pea.
Entree William Earl.
Gotcho Richard
Benzeruk Suhail
Kaue Andrew
Nagarkati Ciders Pea.
Entree William Earl.
Application Number:
JP2013523143A
Publication Date:
September 07, 2016
Filing Date:
June 30, 2011
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
H05H1/46
Domestic Patent References:
| JP2003506888A | ||||
| JP2002507823A | ||||
| JP2005259873A | ||||
| JP2003109942A | ||||
| JP10294307A |
Foreign References:
| US20030015965 | ||||
| KR1020070079870A |
Attorney, Agent or Firm:
Meisei International Patent Office
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