Title:
加圧膜を備える研磨プラテン
Document Type and Number:
Japanese Patent JP4225465
Kind Code:
B2
Abstract:
An invention is disclosed for impoved performance in a CMP process using a pressurized membrane (312) and piezoelectric elements (702) as replacements for a platen (308) air bearing. In one embodiment, a platen form impoving performance in CMP applications is disclosed. The platen includes a membrane disposed above the platen, and a plurality of annular bladders (314) disposed below the membrane, wherein the annular bladders are capable of exerting force on the membrane. In this manner, zonal control is provided during the CMP process. In a further embodiment, piezoeletric elements are disposeed above the platen, which exert force on the polishing belt (310) during a CMP process, resulting in improved zonal control during the CMP process.
Inventors:
Kistler rod
Boyd John
Owls Aleks
Boyd John
Owls Aleks
Application Number:
JP2002551130A
Publication Date:
February 18, 2009
Filing Date:
December 21, 2001
Export Citation:
Assignee:
Applied Materials Incorporated
International Classes:
B24B21/10; H01L21/304; B24B21/04; B24B37/12; B24B49/10; B24B49/16; B24D9/08
Domestic Patent References:
| JP8257894A | ||||
| JP11307486A | ||||
| JP2000210859A | ||||
| JP2000061814A |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yuichi Yamada
Ikeda adult
Yuichi Yamada
Ikeda adult