Title:
A polishing pad which has the polish surface provided with a continuous projection part
Document Type and Number:
Japanese Patent JP6047245
Kind Code:
B2
Abstract:
Polishing pads having a polishing surface with continuous protrusions are described. Methods of fabricating polishing pads having a polishing surface with continuous protrusions are also described.
Inventors:
Lefebvre, Paul Andre
Allison, William Sea.
Simpson, Alexander William
Scott, Diane
Juan, Pin
Charnes, Leslie M.
Line heart, james richard
Cape Rich, Robert
Allison, William Sea.
Simpson, Alexander William
Scott, Diane
Juan, Pin
Charnes, Leslie M.
Line heart, james richard
Cape Rich, Robert
Application Number:
JP2015552686A
Publication Date:
December 21, 2016
Filing Date:
January 16, 2014
Export Citation:
Assignee:
Nexplanar corporation
International Classes:
B24B37/11; B24B37/24; B24B37/26; H01L21/304
Domestic Patent References:
| JP2005183707A | ||||
| JP2000246629A | ||||
| JP2002246343A | ||||
| JP2001150332A | ||||
| JP2005183712A |
Foreign References:
| US6428405 | ||||
| US5441598 |
Attorney, Agent or Firm:
Hidesaku Yamamoto
Natsuki Morishita
Takatoshi Iida
Daisuke Ishikawa
Kensaku Yamamoto
Natsuki Morishita
Takatoshi Iida
Daisuke Ishikawa
Kensaku Yamamoto