Title:
2次ヒドロキシル基を有するアルキル環状オレフィンとアクリル化合物の重合体及びこれらを含んだ化学増幅型レジスト組成物
Document Type and Number:
Japanese Patent JP4200145
Kind Code:
B2
Abstract:
The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resistance, with good resolution in both C/H and L/S patterns, and provides a good pattern profile irrespective of the type of the substrate due to its good process window:
Inventors:
Yu Hyun Sang
Park Yu Hyun
Seodongchul
Lim Yun-Tech
Chosondak
Song Ji Young
Kim Kyun Moon
Park Yu Hyun
Seodongchul
Lim Yun-Tech
Chosondak
Song Ji Young
Kim Kyun Moon
Application Number:
JP2005137645A
Publication Date:
December 24, 2008
Filing Date:
May 10, 2005
Export Citation:
Assignee:
Korea Kumho Petrochemical Co.,Ltd.
International Classes:
C08F232/08; C08F220/12; G03F7/039; H01L21/027
Domestic Patent References:
| JP2002012631A | ||||
| JP2000103819A | ||||
| JP2002202607A |
Attorney, Agent or Firm:
Masayuki Masabayashi
Kazuko Fujita
Kazuko Fujita