Title:
COMPOSITION FOR DENSE SILICEOUS FILM FORMATION
Document Type and Number:
Japanese Patent JP2017200861
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a composition for polysilazane-containing film formation for forming a dense siliceous film having processability, by performing processing by two-step conversion in which a film having a dried surface is formed from a polysilazane composition in the state of little conversion into a siliceous material, and thereafter a secondary processing is applied thereto, to thereby form the siliceous film.SOLUTION: In a formation method of a siliceous material, a specific amine compound and a composition for polysilazane-containing film formation containing polysilazane and a solvent are applied onto a substrate and converted into the siliceous material. The specific amine compound has two amine groups, and the amine group has at least one phenyl-substituted hydrocarbon group.SELECTED DRAWING: Figure 1
Inventors:
NOJIMA YOSHIO
KOBAYASHI MASAICHI
KOBAYASHI MASAICHI
Application Number:
JP2016092672A
Publication Date:
November 09, 2017
Filing Date:
May 02, 2016
Export Citation:
Assignee:
AZ ELECTRONIC MAT LUXEMBOURG SARL
International Classes:
C01B21/068; B05D3/02; B05D3/04; B05D3/06; B05D3/10; B05D7/24; C08J7/04; C08K5/01; C08K5/06; C08K5/17; C08L83/16; C09D7/12; C09D183/16
Attorney, Agent or Firm:
Hiroyuki Nagai
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hideaki Maekawa
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Hideaki Maekawa