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Title:
A preparing method of 4-cyclohexyl 2-methyl 2-butanol
Document Type and Number:
Japanese Patent JP6122091
Kind Code:
B2
Abstract:
Preparing 4-cyclohexyl-2-methyl-2-butanol, comprises (a) reacting styrene with isopropanol at elevated temperature to obtain 4-phenyl-2-methyl-2-butanol, and (b) carrying out heterogeneous-catalytic hydrogenation of the 4-phenyl-2-methyl-2-butanol over a catalyst suitable for ring hydrogenation of aromatics. Independent claims are also included for: (1) a composition comprising 2-methyl-4-phenyl-2-butanol and 2-methyl-4-phenyl-2-pentanol; (2) preparing a composition of 2-methyl-4-phenyl-2-butanol and 2-methyl-4-phenyl-2-pentanol, comprising reacting styrene with isopropanol at elevated temperature under conditions in which isopropanol is present under supercritical conditions, and the molar ratio of styrene to isopropanol is 1:10-1:130; (3) a 4-cyclohexyl-2-methyl-2-pentanol; (4) preparing 4-cyclohexyl-2-methyl-2-pentanol comprising carrying out heterogeneous-catalytic hydrogenation of 2-methyl-4-phenyl-2-pentanol over a catalyst suitable for ring hydrogenation of aromatics; (5) a composition comprising 4-cyclohexyl-2-methyl-2-pentanol; and (6) a composition comprising an additional 4-cyclohexyl-2-methyl-2-butanol.

Inventors:
Ebel, Claus
Ludenauer, Stephan
Palzer, Ralph
Bock, Martin
Application Number:
JP2015236175A
Publication Date:
April 26, 2017
Filing Date:
December 03, 2015
Export Citation:
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Assignee:
BASF SE
International Classes:
C07C33/20; A61K8/34; A61Q13/00; A61Q19/10; B01J23/46; C07B61/00; C07C29/19; C07C29/44; C07C31/135; C11B9/00; C11D3/20; C11D3/50
Domestic Patent References:
JP61115017A
JP55102521A
JP7278021A
Other References:
MICHEL, N. et al.,Preparation of some tertiary alcohols by electrochemical reduction followed by a coupling reaction of an acetone-olefin mixture,Comptes Rendus des Seances de l'Academie des Sciences, Serie C: Sciences Chimiques,1967年,Vol. 265, No. 19,pp. 1044-1047
Tetrahedron Letters,2007年,48,pp. 8460-8463
Attorney, Agent or Firm:
Yusuke Hiraki
Satoshi Fujita
Eiichi Arai
Natsuo Tanaka