Title:
薄膜装置の材料をパターン化するプロセス
Document Type and Number:
Japanese Patent JP2014515178
Kind Code:
A
Abstract:
A method for forming a device includes providing a substrate; depositing a single fluorinated photo-patternable layer over the substrate; forming a first and a second active layer over the substrate; and applying the photo-patternable layer to form a first pattern within the first active layer and a second, different pattern within the second active layer. Particular examples disclosed in the present disclosure can be employed to form thin film electronics devices, including OLED devices and TFTs with a reduced number of photolithographic steps.
Inventors:
John Defranco
Mirror, microphone
Fox
Mirror, microphone
Fox
Application Number:
JP2013556751A
Publication Date:
June 26, 2014
Filing Date:
February 24, 2012
Export Citation:
Assignee:
Orthogonal, Inc.
International Classes:
H01L51/50; G09F9/00; G09F9/30; H01L21/336; H01L27/32; H01L29/786; H05B33/10
Attorney, Agent or Firm:
Isono Dozo