Title:
The process for a tapering fluid bed reaction machine and its use
Document Type and Number:
Japanese Patent JP6272867
Kind Code:
B2
Abstract:
A fluidized bed reactor includes a gas distributor, a tapered section above the gas distributor, and an expanded head above the tapered section. The gas distributor defines a plurality of inlets surrounding a product withdrawal tube, which extends away from the fluidized bed reactor. The fluidized bed reactor is useful in a process for fluidizing relatively large particles, such as Geldart Group B particles and/or Geldart Group D particles, where said particles are in a bubbling fluidized bed residing, in whole or in part, in the tapered section. The fluidized bed reactor and process may be used for manufacturing polycrystalline silicon.
Inventors:
John Vybucci
Raymond Anthony Coco
Max E Detier
Patrick Jay Harder
Lady SB Cali
Ted M Norton
Michael Jay Mornal
Raymond Anthony Coco
Max E Detier
Patrick Jay Harder
Lady SB Cali
Ted M Norton
Michael Jay Mornal
Application Number:
JP2015529894A
Publication Date:
January 31, 2018
Filing Date:
August 26, 2013
Export Citation:
Assignee:
Hemlock Semiconductor Operations LLC
International Classes:
C01B33/027
Domestic Patent References:
| JP8040717A | ||||
| JP11510560A | ||||
| JP2002220219A | ||||
| JP1119508A | ||||
| JP2012507462A | ||||
| JP58204814A |
Other References:
CADORET L.,SILICON CHEMICAL VAPOR DEPOSITION ON MACRO AND SUBMICRON POWDERS IN A FLUIDIZED BED,POWDER TECHNOLOGY,スイス,ELSEVIER SEQUOIA,2009年 3月 5日,V190 N1-2,P185-191
Attorney, Agent or Firm:
Kenji Sugimura
Yamaguchi Yusuke
Hirota Taura
Yamaguchi Yusuke
Hirota Taura