The radiation source device for controlling debris particles, a lithography device, a lighting system, and a method

Japanese Patent JP5955423

B2

A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation. The debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.

Fadim Jefgen Jefici Banine
Refinus Peter Buckel
Alexey Yury Fitch Cholesny Cenko
Johannes Hubertus Josephina Malls
Frank Jerlone Peter Thurmans

JP2015008618A

July 20, 2016

January 20, 2015

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AS M Netherlands B.V.

G03F7/20; H05G2/00

JP2004311814A
JP2005197456A
JP62145633A
JP2004279246A
JP2001326096A
JP2001042098A
JP2006186373A
JP2003007611A
JP2001143893A
JP2008508722A
JP2007528607A
JP2009055072A
JP2001135877A
JP2004207730A

Yoshiyuki Inaba
Toshifumi Onuki

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