Title:
レジスト組成物、レジストパターン形成方法、新規な化合物及び酸発生剤
Document Type and Number:
Japanese Patent JP5557657
Kind Code:
B2
Abstract:
A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below (wherein Z+ represents an organic cation).
Inventors:
Yoshiyuki Utsumi
Takehiro Seshimo
Takehiro Seshimo
Application Number:
JP2010196761A
Publication Date:
July 23, 2014
Filing Date:
September 02, 2010
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO., LTD.
International Classes:
G03F7/004; C07D309/30; C07D327/04; C07D333/46; C07D333/52; C07D333/76; C07D335/02; C07D335/16; C07D493/18; C08F220/28; C09K3/00; G03F7/039
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Mitsuyoshi Suzuki
Igarashi Mitsunaga
Masatake Shiga
Mitsuyoshi Suzuki
Igarashi Mitsunaga