Title:
A resist composition, a resist pattern formation method, a manufacturing method of a thick film resist pattern, a manufacturing method of a contact button
Document Type and Number:
Japanese Patent JP6103908
Kind Code:
B2
Inventors:
Takataka Mori
Takahiro Shimizu
Takahiro Shimizu
Application Number:
JP2012268211A
Publication Date:
March 29, 2017
Filing Date:
December 07, 2012
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; C09K3/00; G03F7/039; H05K3/00
Domestic Patent References:
| JP2001281862A | ||||
| JP2001281863A | ||||
| JP2006330366A | ||||
| JP2006330367A | ||||
| JP2006330368A | ||||
| JP2007065642A | ||||
| JP2007178903A | ||||
| JP2007256935A | ||||
| JP2007272087A | ||||
| JP2008058710A | ||||
| JP2010008972A | ||||
| JP2012008369A | ||||
| JP2014115386A | ||||
| JP2014114225A |
Foreign References:
| WO2014087998A1 |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi