Title:
レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4678413
Kind Code:
B2
Abstract:
Lactone-containing compounds having formula (1) are novel wherein R 1 is H, F, methyl or trifluoromethyl, R 2 and R 3 are H or monovalent hydrocarbon groups, or R 2 and R 3 may together form an aliphatic hydrocarbon ring, R 4 is H or CO 2 R 5 , R 5 is a monovalent hydrocarbon group, W is CH 2 , O or S, and k 1 is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation s 500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.
Inventors:
Koji Hasegawa
Satoshi
Katsuhiro Kobayashi
Tsunehiro Nishi
Tsuyoshi Kanao
Satoshi
Katsuhiro Kobayashi
Tsunehiro Nishi
Tsuyoshi Kanao
Application Number:
JP2008064337A
Publication Date:
April 27, 2011
Filing Date:
March 13, 2008
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/039; G03F7/004; G03F7/11; G03F7/38; H01L21/027; C07D307/00; C07D493/18; C08F20/28
Domestic Patent References:
| JP2008031298A | ||||
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Foreign References:
| WO2009107327A1 |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa