Title:
ラジカル重合性官能基を有するシルセスキオキサン誘導体、その組成物および低硬化収縮性硬化膜
Document Type and Number:
Japanese Patent JP6850408
Kind Code:
B2
Abstract:
The purpose of the present invention is to provide a novel compound capable of imparting a low cure shrinkage while suppressing a decrease in the hardness (scratch resistance) of a cured film obtained from a resin composition. Provided is a silsesquioxane derivative having a radical polymerizable functional group, represented by formula (1), (2), or (3). In formulae (1)-(3), R1 is a group independently selected from among a C1-45 alkyl, a C4-8 cycloalkyl, a C6-14 aryl, and a C7-24 arylalkyl, R2 and R3 are groups independently selected from among a C1-10 alkyl, a cyclopentyl, a cyclohexyl, and a phenyl, X is independently a hydrogen or a monovalent organic group, and at least one in X is a radical polymerizable functional group represented by formula (4).
Inventors:
Kazuya Suwa
Hiroaki Ikeno
Tomoyuki Oba
Hiroaki Ikeno
Tomoyuki Oba
Application Number:
JP2018561363A
Publication Date:
March 31, 2021
Filing Date:
January 09, 2018
Export Citation:
Assignee:
JNC Corporation
jnc Petrochemical Co., Ltd.
jnc Petrochemical Co., Ltd.
International Classes:
C07F7/21; B32B27/00; C08F30/08; C08F290/06; C08G77/20; C08G77/26; C08G77/38
Domestic Patent References:
| JP2004004612A | ||||
| JP2004331647A |
Foreign References:
| WO2004024741A1 | ||||
| WO2003024870A1 | ||||
| WO2010024119A1 |
Attorney, Agent or Firm:
Hidewa Patent Office