Title:
A source of a photocathode type electron beam, its preparation method, and a source system of a photocathode type electron beam
Document Type and Number:
Japanese Patent JP6192097
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide "a photo cathode type electron beam source, a manufacturing method thereof, and a photo cathode type electron beam source system", capable of generating electron beams with dramatically high luminance as compared with conventional electron beam sources and allowing the use life thereof to extend dramatically.SOLUTION: The problem mentioned above can be solved by using a photo cathode type electron beam source 11. The photo cathode type electron beam source 11 is formed on a tip surface 20a of a cathode tip 20 and includes a junction layer 21 formed on the tip surface 20a, a photoelectron emission layer 22 formed on one surface 21a of the junction layer 21, and a protection processing layer 23 formed on one surface 22a of the photoelectron emission layer 22. The junction layer 21 is made of a film of a material that does not react with the cathode tip 20 and does not react with a material comprising the photoelectron emission layer 22. The protection processing layer 23 is made of a passive film formed by the oxidation of a material that does not react with a material comprising the photoelectron emission layer 22.
Inventors:
Takayoshi Kimoto
Application Number:
JP2013115335A
Publication Date:
September 06, 2017
Filing Date:
May 31, 2013
Export Citation:
Assignee:
National Institute for Materials Science
International Classes:
H01J1/34; H01J9/12; H01J37/073
Domestic Patent References:
| JP5299052A | ||||
| JP10021821A | ||||
| JP2006134664A |