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Title:
ROTATABLE SUBSTRATE SUPPORT HAVING HIGH FREQUENCY APPLICATOR
Document Type and Number:
Japanese Patent JP2018113452
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a rotatable board support capable of RF application with no arc generation.SOLUTION: A board support assembly 700 for use in a processing chamber includes a shaft assembly 126, a pedestal coupled to a part of the shaft assembly and a first rotary connector 134 coupled to the shaft assembly. The first rotary connector includes a first coil 215 surrounding a rotatable shaft member, connected electrically with the shaft assembly, and rotatable together with the rotatable shaft, and a second coil 220 surrounding the first coil, and is stationary with respect to the first coil. When a rotary high frequency applicator is given with energy, and supplies high frequency signal/power to the pedestal through the shaft assembly, the first coil member is coupled electrically with the second coil member.SELECTED DRAWING: Figure 7

Inventors:
KOBAYASHI OSAMU
KIRBY H FLOYD
HANAWA KOJI
PARK SOONAM
DMITRY LUBOMIRSKY
JASON A KENNEY
Application Number:
JP2018024889A
Publication Date:
July 19, 2018
Filing Date:
February 15, 2018
Export Citation:
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Assignee:
APPLIED MATERIALS INC
International Classes:
H01L21/3065; C23C16/458; H01L21/205; H01L21/683; H05H1/46
Domestic Patent References:
JPH05198390A1993-08-06
JPH08162288A1996-06-21
JP2002110555A2002-04-12
JP2004342984A2004-12-02
JP2010165798A2010-07-29
JP2013042061A2013-02-28
Foreign References:
US20060005930A12006-01-12
Attorney, Agent or Firm:
Sonoda/Kobayashi Patent Business Corporation