The substrate processing device for mask blanks, the substrate treating method for mask blanks, a manufacturing method of the substrate for mask blanks, a manufacturing method of a mask blank, and a manufacturing method of the mask for transfer

Japanese Patent JP5980957

B2

Provided are a mask blank substrate processing device, a mask blank substrate processing method, a mask blank substrate fabrication method, a mask blank fabrication method, and a transfer mask fabrication method, for surface processing a mask blank substrate such that a high-level smoothness and a low-defect quality are satisfied. A mask blank substrate processing device (1) comprises: substrate support means (3) for supporting a substrate (Y); a catalytic surface plate (4) comprising a catalytic face (4a) which is positioned opposite the principal surface of the substrate (Y); relative movement means (5) for causing the catalytic face (4a) and the principal surface to move relative to each other in a state of being either in contact or in close proximity; first processing fluid supply means (6) which supplies a first processing fluid for CARE to the principal surface; and physical cleaning means (7) for removing foreign matter which has adhered to the principal surface from the principal surface, using a physical action.

Takeyuki Yamada
Toshihiko Orihara
Takahito Nishimura

JP2014554448A

August 31, 2016

December 24, 2013

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HOYA CORPORATION

G03F1/60; C03C15/00; C03C23/00; G03F1/22

JP2007283410A	2007-11-01
JP2008071857A	2008-03-27
JP2008121099A	2008-05-29
JP2008136983A	2008-06-19
JP2006226733A	2006-08-31
JP2009117782A	2009-05-28
JP2007283410A	2007-11-01
JP2008071857A	2008-03-27
JP2008121099A	2008-05-29
JP2008136983A	2008-06-19
JP2006226733A	2006-08-31

Yutaka Nagata
Takafumi Oshima
Tsukasa Ota

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