Title:
高速イオンを発生させるためのシステム及び方法
Document Type and Number:
Japanese Patent JP5591824
Kind Code:
B2
Abstract:
The present invention discloses a system and method for generating a beam of fast ions. The system comprising: a target substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and; a beam unit adapted for receiving a high power coherent electromagnetic radiation beam and focusing it onto said patterned surface of the target substrate to cause interaction between said radiation beam and said substrate enabling creation of fast ions.
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Inventors:
Allier Ziglar
Shmuel Eisenman
Tara Pal Chang
Shmuel Eisenman
Tara Pal Chang
Application Number:
JP2011541715A
Publication Date:
September 17, 2014
Filing Date:
December 20, 2009
Export Citation:
Assignee:
The Isamu research development, the company オブ the ヘブルー university オブ Jerusalem Limited
International Classes:
H01J27/24; G21K1/00
Attorney, Agent or Firm:
Yasuhiko Murayama
Masatake Shiga
Takashi Watanabe
Shinya Jitsuhiro
Masatake Shiga
Takashi Watanabe
Shinya Jitsuhiro