Title:
A system and a method of programming a memory cell
Document Type and Number:
Japanese Patent JP6280164
Kind Code:
B2
Abstract:
An apparatus includes a semiconductor transistor structure. The semiconductor transistor structure includes dielectric material, a channel region, a gate, a source overlap region, and a drain overlap region. The source overlap region is biasable to cause a first voltage difference between the source overlap region and the gate to exceed a breakdown voltage of the dielectric material. The drain overlap region is biasable to cause a second voltage difference between the drain overlap region and the gate to exceed the breakdown voltage. The apparatus includes a well line coupled to a body of the semiconductor transistor. The apparatus includes circuitry configured to apply a voltage to the well line to prevent a breakdown condition between the channel region and the gate.
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Inventors:
Xia Li
Bin Yang
Bin Yang
Application Number:
JP2016136610A
Publication Date:
February 14, 2018
Filing Date:
July 11, 2016
Export Citation:
Assignee:
Qualcomm, Inc.
International Classes:
G11C17/16; H01L27/10
Domestic Patent References:
JP2006059919A | ||||
JP2009503901A | ||||
JP5013776A | ||||
JP2010198685A |
Foreign References:
US20060054952 | ||||
US20120008364 | ||||
US20040047218 |
Attorney, Agent or Firm:
Yasuhiko Murayama
Kuroda Shinpei
Kuroda Shinpei