Title:
気体状の流体から汚染物質を浄化および除去するためのシステム
Document Type and Number:
Japanese Patent JP2007500055
Kind Code:
A
Abstract:
A system and corresponding methods for purifying and removing contaminants from gaseous fluids includes a housing including an inlet, an outlet, and an elongated UV chamber disposed within the housing. The UV radiation source is disposed longitudinally within the UV chamber. At least one baffle structure is disposed at an upstream location within the housing to restrict flow as well as to generate a turbulent flow of the gaseous fluid within the UV chamber. In addition, a fan is disposed at a selected location within the housing to facilitate a flow of the gaseous fluid through the housing at a selected flow rate. The dimensions of the UV chamber and UV source and the configuration of the baffle structure are selected to increase the exposure time and mixing of fluid flowing through the UV chamber as well as increase the proximity of the flowing fluid to the UV source.
Inventors:
Nelsen, Roger
Longan, John
Fumin, Cowan
Longan, John
Fumin, Cowan
Application Number:
JP2006532909A
Publication Date:
January 11, 2007
Filing Date:
May 10, 2004
Export Citation:
Assignee:
Eco-Rx, Inc.
International Classes:
A61L9/20; A61L9/16; F24F8/22; A62B7/08; B01D39/00; B01D41/00; B01D46/00; B01D50/00; B01D51/00; B01D53/00; B01J35/02; B03C3/016; B03C3/32; B03C3/36; F24F8/80; B01D
Domestic Patent References:
| JP2002045415A | 2002-02-12 | |||
| JPH06327965A | 1994-11-29 | |||
| JPH10511572A | 1998-11-10 | |||
| JPH11179350A | 1999-07-06 | |||
| JPH1147257A | 1999-02-23 | |||
| JPH1157696A | 1999-03-02 | |||
| JP2001190646A | 2001-07-17 | |||
| JP3089444U | 2002-10-25 |
Foreign References:
| WO2002004036A1 | 2002-01-17 | |||
| US6500387B1 | 2002-12-31 |
Attorney, Agent or Firm:
Hidesaku Yamamoto
Takaaki Yasumura
Natsuki Morishita
Takaaki Yasumura
Natsuki Morishita