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Title:
MANUFACTURING DEVICE FOR SUBSTRATE PROVIDED WITH OPTICAL THIN FILM
Document Type and Number:
Japanese Patent JP3242802
Kind Code:
B2
Abstract:

PURPOSE: To provide a manufacturing device for substrate provided with an optical thin film capable of manufacturing in high productivity the substrate provided with the optical thin film such as antireflection filter by using a relatively small manufacturing device.
CONSTITUTION: A source 2 generating a film forming particles flux and a moving means for a substrate to be film-formed moving the substrates 210 and 210' to be film-formed so that the substrates pass through a region in which the substrates are exposed to the film forming particles flux 5 generated by the source 2 for generating film forming particles flux, a film forming monitor plate 208 movable in a range including the outside of the range in which the substrate to be film-formed is exposed to the film forming particles flux 5, an optical interference film thickness measuring device 7, an optical fiber bandle 240 bonding optically between the measuring device 7 and the monitor plate 208 and a film forming process controlling means 260 controlling the film forming processing based on a film thickness of a monitor thin film formed on the monitor plate 208 and measured by the measuring device 7 are provided.


Inventors:
Fumiho Nomura
Takeshi Saito
Kazuo Kikuchi
Shigeharu Matsumoto
Shinichiro Saisho
Application Number:
JP30314094A
Publication Date:
December 25, 2001
Filing Date:
November 11, 1994
Export Citation:
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Assignee:
Toray Industries, Inc.
Syncron Co., Ltd.
International Classes:
G02B5/20; C23C14/54; G02B1/11; G02B1/113; H01L21/203; H01L21/66; (IPC1-7): G02B5/20; C23C14/54; G02B1/11; H01L21/203; H01L21/66
Domestic Patent References:
JP4180561A
JP6289866A
JP553012A
JP5127008A
JP389201A
JP6240440A
Attorney, Agent or Firm:
Toshimitsu Ban



 
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