Title:
215-222 NM WAVELENGTH LASER BEAM GENERATING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2022/181676
Kind Code:
A1
Abstract:
The present invention pertains to a 215-222 nm wavelength laser beam generating apparatus which comprises: an excitation light source unit that converts laser beams with wavelengths of 1030-1064 nm into second harmonics and generates laser beams with wavelengths of 515-532 nm; an optical parametric oscillation unit that generates signal beams with wavelengths of 858-887 nm and idler beams with wavelengths of 1288-1330 nm by using the laser beams with the wavelengths of 515-532 nm as excitation light; a separation unit that separates the signal beams and the idler beams; a first wavelength conversion unit that generates fourth harmonics from the signal beams; a second wavelength conversion unit that generates deep ultraviolet rays with wavelengths of 215-222 nm from the idler beams through optical sum frequency generation with the second harmonics of the excitation light; and a coupling unit that couples the fourth harmonics from the first wavelength conversion unit with the deep ultraviolet rays from the second wavelength conversion unit. The present invention provides a laser beam generating apparatus that is able to generate simply and efficiently pulse laser beams with wavelengths of 215-222 nm, including a wavelength of 222 nm at which microorganisms are deactivated.
Inventors:
UMEMURA NOBUHIRO (JP)
KAMIMURA TOMOSUMI (JP)
HORIKOSHI HIDEHARU (JP)
KAMIMURA TOMOSUMI (JP)
HORIKOSHI HIDEHARU (JP)
Application Number:
PCT/JP2022/007566
Publication Date:
September 01, 2022
Filing Date:
February 24, 2022
Export Citation:
Assignee:
UMEMURA NOBUHIRO (JP)
JOSHO GAKUEN EDUCATIONAL FOUND (JP)
TOSOH SGM CORP (JP)
JOSHO GAKUEN EDUCATIONAL FOUND (JP)
TOSOH SGM CORP (JP)
International Classes:
G02F1/37; G02F1/39
Domestic Patent References:
| WO1999014631A1 | 1999-03-25 | |||
| WO2015174388A1 | 2015-11-19 |
Foreign References:
| CN112003118A | 2020-11-27 | |||
| CN111404011A | 2020-07-10 | |||
| JP2012252289A | 2012-12-20 | |||
| JP2021027496A | 2021-02-22 | |||
| JP2016220684A | 2016-12-28 | |||
| JP2017136145A | 2017-08-10 | |||
| JP2018114197A | 2018-07-26 | |||
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| JP2003280055A | 2003-10-02 |
Other References:
SAKUMA JUN, ASAKAWA YUICHI, IMAHOKO TOMOHIRO, OBARA MINORU: "Generation of all-solid-state, high-power continuous-wave 213-nm light based on sum-frequency mixing in CsLiB 6 O 10", OPTICS LETTERS, vol. 29, no. 10, 15 May 2004 (2004-05-15), pages 1096 - 1098, XP055961647, DOI: 10.1364/OL.29.001096
MIROV, S.B. FEDOROV, V.V. BOCZAR, B. FROST, R. PRYOR, B.: "All-solid-state laser system tunable in deep ultraviolet based on sum-frequency generation in CLBO", OPTICS COMMUNICATIONS, ELSEVIER, AMSTERDAM, NL, vol. 198, no. 4-6, 1 November 2001 (2001-11-01), AMSTERDAM, NL , pages 403 - 406, XP004323186, ISSN: 0030-4018, DOI: 10.1016/S0030-4018(01)01514-0
MIROV, S.B. FEDOROV, V.V. BOCZAR, B. FROST, R. PRYOR, B.: "All-solid-state laser system tunable in deep ultraviolet based on sum-frequency generation in CLBO", OPTICS COMMUNICATIONS, ELSEVIER, AMSTERDAM, NL, vol. 198, no. 4-6, 1 November 2001 (2001-11-01), AMSTERDAM, NL , pages 403 - 406, XP004323186, ISSN: 0030-4018, DOI: 10.1016/S0030-4018(01)01514-0
Attorney, Agent or Firm:
SIKS & CO. (JP)
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