Title:
ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING LETTERPRESS PRINTING PLATE USING SAID PHOTOSENSITIVE RESIN STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2018/056211
Kind Code:
A1
Abstract:
Provided is an ablation layer for a photosensitive resin for a letterpress printing plate, the ablation layer comprising at least an acid-modified polymer and an infrared ray absorber. In the ablation layer, the layer acid value is 2 to 400 mgKOH/g and the neutral salt percentage is 0.9 or less. Layer acid value = (acid value of the acid-modified polymer) × (mass ratio of acid-modified polymer in terms of entire ablation layer) Neutral salt percentage = (number of moles of polymer where acid in the acid-modified polymer is present in state of neutral salt)/(total number of moles of the acid-modified polymer)
Inventors:
NAKAGAWA NORIKIYO (JP)
Application Number:
PCT/JP2017/033471
Publication Date:
March 29, 2018
Filing Date:
September 15, 2017
Export Citation:
Assignee:
ASAHI CHEMICAL IND (JP)
International Classes:
B41N1/12; G03F7/00; G03F7/004; G03F7/033; G03F7/075; G03F7/11
Domestic Patent References:
| WO2009150703A1 | 2009-12-17 | |||
| WO2011118052A1 | 2011-09-29 |
Foreign References:
| JP2013101394A | 2013-05-23 | |||
| JP2015011330A | 2015-01-19 | |||
| US20160131979A1 | 2016-05-12 | |||
| JP2012068423A | 2012-04-05 | |||
| US20130269557A1 | 2013-10-17 | |||
| US8920692B2 | 2014-12-30 | |||
| US20100021842A1 | 2010-01-28 | |||
| US20150079322A1 | 2015-03-19 |
Other References:
See also references of EP 3517310A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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