Title:
ABNORMALITY DETERMINATION METHOD FOR BLAST FURNACE, TRAINING METHOD FOR STABILIZATION PERIOD MODEL, OPERATION METHOD FOR BLAST FURNACE, AND ABNORMALITY DETERMINATION DEVICE FOR BLAST FURNACE
Document Type and Number:
WIPO Patent Application WO/2021/182041
Kind Code:
A1
Abstract:
This abnormality determination method for a blast furnace includes an abnormality determination step for inputting a plurality of pieces of operation data to be determined to a stabilization period model trained by using a plurality of pieces of operation data in a stabilization period of the blast furnace to make input values and output values equal, and determining an abnormality in an operation for the blast furnace on the basis of the difference between the input values and the output values at that time.
Inventors:
SHIMAMOTO HIROYUKI (JP)
KOBASHI YOSHIFUMI (JP)
KOBASHI YOSHIFUMI (JP)
Application Number:
PCT/JP2021/005879
Publication Date:
September 16, 2021
Filing Date:
February 17, 2021
Export Citation:
Assignee:
JFE STEEL CORP (JP)
International Classes:
C21B7/24
Foreign References:
| JPS5370852A | 1978-06-23 | |||
| JPH0625725A | 1994-02-01 | |||
| JPS4964508A | 1974-06-22 | |||
| JP2017128805A | 2017-07-27 | |||
| KR20190078319A | 2019-07-04 |
Other References:
AN, J: "Variational autoencoder based anomaly detection using reconstruction probability", SPECIAL LECTURE ON IE, vol. 2, no. 1, 2015, pages 1 - 18, XP055491966
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
Download PDF:
Previous Patent: SWITCH DEVICE
Next Patent: REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
Next Patent: REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE