ABRASIVE FILM AND METHOD OF PRODUCING THE SAME

Title:

ABRASIVE FILM AND METHOD OF PRODUCING THE SAME

Document Type and Number:

WIPO Patent Application WO/2002/092286

Kind Code:

A1

Abstract:

An abrasive film capable of finish-polishing to a smooth surface with no unpolished area; and a method of producing the same. An abrasive film prepared by forming an abrasive layer (5) on the surface of a plastic film (1). The abrasive layer (5) is formed by fixing mixed particles consisting of silica particles (2) having a first average particle diameter and silica particles (3) having a second average particle diameter different from the first average particle diameter that are selected from the average particle diameter range of 0.001 - 10 $g(m)m, by a resin binder (4). Reticular cracks (6) are formed in the surface of the abrasive layer (5) to arrest the swarf produced during polishing. The particle size distribution of the mixed particles consisting of silica particles having the first and second average particle diameters shows a peak at two different particle diameter values respectively corresponding to the first and second average particle diameters.

Inventors:

YAMAZAKI TORU (JP)
BABA TETSUYA (JP)
MURATA OSAMU (JP)

Application Number:

PCT/JP2002/004275

Publication Date:

November 21, 2002

Filing Date:

April 26, 2002

Export Citation:

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Assignee:

NIPPON MICRO COATING KK (JP)
NTT ADVANCED TECHNOLOGY CO LTD (JP)
YAMAZAKI TORU (JP)
BABA TETSUYA (JP)
MURATA OSAMU (JP)

International Classes:

B24B19/22; B24D3/28; B24D11/00; B32B27/14; B05D5/02; G02B6/38; (IPC1-7): B24D3/00; B24B3/28; B24D11/00

Domestic Patent References:

WO1999014016A1

1999-03-25

Foreign References:

JPH11333731A	1999-12-07
EP0737549A2	1996-10-16
JP2000354970A	2000-12-26
JPH10277957A	1998-10-20
US5573816A	1996-11-12
JPH11333731A	1999-12-07

Other References: