Title:
ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR
Document Type and Number:
WIPO Patent Application WO/2017/018361
Kind Code:
A1
Abstract:
The present invention is a compound represented by general formula (A), a base and/or radical generator obtained by containing said compound, and the like. (In the formula: four R1 groups each independently represents a hydrogen atom or a fluorine atom; four R2 groups each independently represents a fluorine atom or a trifluoromethyl group; R3, R6, R7, and R10 each independently represents a hydrogen atom or a C1-12 alkyl group; R4 and R5 each independently represents a hydrogen atom or a C1-12 alkyl group, or R4 and R5 are bonded to each other to represent a C2-4 alkylene group; R8 and R9 each independently represents a hydrogen group, a C1-12 alkyl group, or a C6-14 aryl group which may have a substituent such as a C1-6 alkyl group, or R8 and R9 are bonded to each other to represent a C2-4 alkylene group, with the caveat that two to three of the eight R3-R8 groups are hydrogen atoms, three to six of the remaining groups are alkyl groups if two of the eight groups are hydrogen atoms, and four to five of the remaining groups are alkyl groups if three of the eight groups are hydrogen atoms).
Inventors:
YANABA KOSUKE (JP)
SAKAI NOBUHIKO (JP)
IMAZEKI SHIGEAKI (JP)
SAKAI NOBUHIKO (JP)
IMAZEKI SHIGEAKI (JP)
Application Number:
PCT/JP2016/071640
Publication Date:
February 02, 2017
Filing Date:
July 22, 2016
Export Citation:
Assignee:
WAKO PURE CHEM IND LTD (JP)
International Classes:
C07C279/26; C07F5/02; C08G59/68; C08K5/29; C08L101/00; C09K3/00
Domestic Patent References:
| WO2015083331A1 | 2015-06-11 | |||
| WO2014208632A1 | 2014-12-31 | |||
| WO2015111640A1 | 2015-07-30 |
Foreign References:
| JP2010138234A | 2010-06-24 | |||
| JPH09278738A | 1997-10-28 |
Other References:
See also references of EP 3327002A4
Download PDF: