Title:
ACTINIC LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICES
Document Type and Number:
WIPO Patent Application WO/2022/172602
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing an actinic light-sensitive or radiation-sensitive resin composition that exhibits an excellent sensitivity to photoexposure. The present invention also addresses the problem of providing a resist film, a pattern formation method, and a method for producing electronic devices, that each involve the actinic light-sensitive or radiation-sensitive resin composition. The actinic light-sensitive or radiation-sensitive resin composition contains a resin that undergoes an increase in polarity through decomposition by the action of acid, and the resin composition satisfies at least one of the following: the resin composition contains a compound given by formula (1); and the resin that undergoes an increase in polarity through decomposition by the action of acid has a residue formed by removing one hydrogen atom from the compound given by formula (1).
Inventors:
MIYOSHI TARO (JP)
YAMAGUCHI SHUHEI (JP)
FUKUZAKI EIJI (JP)
YOSHIOKA TOMOAKI (JP)
YAMAGUCHI SHUHEI (JP)
FUKUZAKI EIJI (JP)
YOSHIOKA TOMOAKI (JP)
Application Number:
PCT/JP2021/047175
Publication Date:
August 18, 2022
Filing Date:
December 21, 2021
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C07C309/67; C07C309/68; C07C309/73; C08F220/12; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| WO2018193954A1 | 2018-10-25 | |||
| WO2020004306A1 | 2020-01-02 | |||
| WO2020066824A1 | 2020-04-02 | |||
| WO2017154345A1 | 2017-09-14 | |||
| WO2018019395A1 | 2018-02-01 |
Foreign References:
| JPH04215661A | 1992-08-06 | |||
| JP2002236359A | 2002-08-23 | |||
| JP2002236358A | 2002-08-23 | |||
| JP2008111120A | 2008-05-15 | |||
| US20120135348A1 | 2012-05-31 | |||
| US20160070167A1 | 2016-03-10 | |||
| US20150004544A1 | 2015-01-01 | |||
| US20160237190A1 | 2016-08-18 | |||
| US20160274458A1 | 2016-09-22 | |||
| JP2014059543A | 2014-04-03 | |||
| JP2013061648A | 2013-04-04 |
Attorney, Agent or Firm:
YONEKURA Junzo et al. (JP)
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