Title:
ACTINIC-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIST COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/066342
Kind Code:
A1
Abstract:
The present invention provides an actinic-light-sensitive or radiation-sensitive resin composition having superior LER performance and collapse-prevention performance. Also provided are a resist film, a pattern formation method, and a method for manufacturing an electronic device. The actinic-light-sensitive or radiation-sensitive resin composition of the present invention contains: an acid-degradable resin that has a repeating unit represented by general formula (1); and a compound that generates an acid when irradiated with actinic light or radiation.
Inventors:
KANEKO AKIHIRO (JP)
YAGI KAZUNARI (JP)
KAWASHIMA TAKASHI (JP)
GOTO AKIYOSHI (JP)
YAGI KAZUNARI (JP)
KAWASHIMA TAKASHI (JP)
GOTO AKIYOSHI (JP)
Application Number:
PCT/JP2019/031624
Publication Date:
April 02, 2020
Filing Date:
August 09, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/039; C08F212/14; G03F7/20
Domestic Patent References:
| WO2017029891A1 | 2017-02-23 |
Foreign References:
| JP2018095851A | 2018-06-21 | |||
| JP2017214480A | 2017-12-07 | |||
| JP2000267280A | 2000-09-29 | |||
| JP2018205710A | 2018-12-27 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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