Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/174215
Kind Code:
A1
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition comprising a photoacid generator and resin (B), said resin composition comprising, as the photoacid generator, at least photoacid generator (A) represented by general formula (I).

Inventors:
KITAMURA TETSU (JP)
KATAOKA SHOHEI (JP)
GOTO AKIYOSHI (JP)
KATO KEITA (JP)
SHIBUYA AKINORI (JP)
Application Number:
PCT/JP2015/061892
Publication Date:
November 19, 2015
Filing Date:
April 17, 2015
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; C07C309/12; C07C309/17; C07C381/12; C07D411/06; C09K3/00; G03F7/038; G03F7/039
Domestic Patent References:
WO2011115138A12011-09-22
Foreign References:
JP2010164958A2010-07-29
JP2014026265A2014-02-06
JP2013147485A2013-08-01
JP2013117693A2013-06-13
JP2013213951A2013-10-17
JP2014224984A2014-12-04
JP2011116746A2011-06-16
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (JP)
Junko Nakajima (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: METHOD FOR PRODUCING α-BROMOACETOPHENONE COMPOUND

Next Patent: COMPOSITE, LAMINATE, ELECTRONIC DEVICE, AND MANUFACTURING METHODS THEREFOR