Title:
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/158326
Kind Code:
A1
Abstract:
Provided is an actinic-ray-sensitive or radiation-sensitive resin composition that, when forming an ultra-fine pattern (for example a line and space pattern of 30 nm or less, a hole pattern with a hole diameter of 30 nm or less, or the like), is superior in terms of roughness performance, and that can suppress the occurrence of defects in a pattern. The actinic-ray-sensitive or radiation-sensitive resin composition contains : a resin (A) that has a repeating unit having an aromatic ring that has a halogen atom-free substituted group and a halogen atom or a halogen atom-containing organic group; and (Y) an ionic compound having a halogen atom in the cationic part. The content of said ionic compound (Y) is 5.0 mass% or more of the total solid content of said composition.
Inventors:
YOSHIMURA TSUTOMU (JP)
KOJIMA MASAFUMI (JP)
GOTO AKIYOSHI (JP)
KURUMISAWA YUMA (JP)
KOJIMA MASAFUMI (JP)
GOTO AKIYOSHI (JP)
KURUMISAWA YUMA (JP)
Application Number:
PCT/JP2022/000482
Publication Date:
July 28, 2022
Filing Date:
January 11, 2022
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C08F20/12; G03F7/004; G03F7/038; G03F7/039; G03F7/20
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Other References:
"Proc. of SPIE", vol. 6924, 2008, article "Journal of The International Society for Optical Engineering", pages: 692420
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Attorney, Agent or Firm:
YONEKURA Junzo et al. (JP)
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