ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND COMPOUND

WIPO Patent Application WO/2023/120250

A1

Provided is an actinic-ray-sensitive or radiation-sensitive resin composition, etc. that, when forming an ultra-fine pattern (for example, a line and space pattern of 25 nm or less, or a hole pattern with a hole diameter of 25 nm or less, etc.), has an extremely excellent pattern shape.　The actinic-ray-sensitive or radiation-sensitive resin composition includes a resin, and an ionic compound comprising a group represented by -SF4R on at least one of a cation part and an anion part.

JPH04340963	PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING THAT
JPWO2017056831	Photosensitive composition, cured film, infrared cut filter, infrared transmission filter, method for manufacturing cured film, solid-state image sensor, image display device, method for manufacturing solid-state image sensor, and method for manufacturing infrared sensor

KOJIMA MASAFUMI (JP)
GOTO AKIYOSHI (JP)

PCT/JP2022/045518

June 29, 2023

December 09, 2022

Click for automatic bibliography generation  

FUJIFILM CORP (JP)

G03F7/004; C07C25/18; C07C309/06; C07C309/12; C07C309/42; C07C309/65; C07C311/53; C07C381/00; C07C381/12; C07D307/00; C07D317/72; C07D321/10; C07D327/06; C07D333/76; G03F7/038; G03F7/039; G03F7/20

WO2020105346A1	2020-05-28
WO2022270134A1	2022-12-29

JP2016040240A

2016-03-24

KOH-EI, P.C. (JP)

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