Title:
ACTIVE ENERGY RAY-CURABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2007/043431
Kind Code:
A1
Abstract:
Disclosed is an active energy ray-curable composition which exhibits high exposure sensitivity and good developability, thereby enabling to form a precise and accurate pattern when used as an active energy ray-curable pattern-forming composition. This active energy ray-curable composition is excellent in various physical properties such as coating film strength, heat resistance and chemical resistance after it is cured. The active energy ray-curable composition contains, as essential components, a compound (a) wherein an acid anhydride is added to a compound having three or more (meth)acryloyl groups and a hydroxyl group, and a compound (b) wherein a hydroxyl group in a compound having three or more (meth)acryloyl groups and a hydroxyl group is added to at least one (meth)acryloyl group of the component (a) by Michael addition.
Inventors:
HASEGAWA MITSUTAKA (JP)
KOJIMA SHINJI (JP)
KOJIMA SHINJI (JP)
Application Number:
PCT/JP2006/319942
Publication Date:
April 19, 2007
Filing Date:
October 05, 2006
Export Citation:
Assignee:
TOAGOSEI CO LTD (JP)
HASEGAWA MITSUTAKA (JP)
KOJIMA SHINJI (JP)
HASEGAWA MITSUTAKA (JP)
KOJIMA SHINJI (JP)
International Classes:
C08F20/20; C08F2/46
Foreign References:
| JP2000017030A | 2000-01-18 | |||
| JPH08160616A | 1996-06-21 | |||
| JPH03223856A | 1991-10-02 |
Attorney, Agent or Firm:
IDE, Masatake et al. (9F Gobancho Grand Bldg., 3-1, Gobanch, Chiyoda-ku Tokyo 76, JP)
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