Title:
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, METHOD FOR PRODUCING ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE PRODUCING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/163816
Kind Code:
A1
Abstract:
Provided are: an active light sensitive or radiation sensitive composition having excellent resolution and little variation in sensitivity when an ultrafine pattern is formed; a method for producing the active light sensitive or radiation sensitive composition; and a pattern forming method and an electronic device producing method, which use the active light sensitive or radiation sensitive composition. The active light sensitive or radiation sensitive composition, and the active light sensitive or radiation sensitive composition produced by the production method for the active light sensitive or radiation sensitive composition, each contains a ligand and a cation having a metal atom, wherein the value of σ represented by equation (1) is 2.2 or less. In the pattern forming method and the electronic device producing method, the active light sensitive or radiation sensitive composition is used.
Inventors:
NIHASHI WATARU (JP)
TSUBAKI HIDEAKI (JP)
TSUBAKI HIDEAKI (JP)
Application Number:
PCT/JP2017/008450
Publication Date:
September 28, 2017
Filing Date:
March 03, 2017
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; G03F7/26
Domestic Patent References:
| WO2009123109A1 | 2009-10-08 |
Foreign References:
| JP2011253185A | 2011-12-15 | |||
| US20150056542A1 | 2015-02-26 | |||
| JP2011253185A | 2011-12-15 | |||
| US20150056542A1 | 2015-02-26 | |||
| JP2013011833A | 2013-01-17 | |||
| US20110039195A1 | 2011-02-17 | |||
| JP2013068814A | 2013-04-18 | |||
| US20080248425A1 | 2008-10-09 | |||
| JP2002090991A | 2002-03-27 | |||
| JPH1121393A | 1999-01-26 | |||
| JPH1045961A | 1998-02-17 | |||
| JPH03270227A | 1991-12-02 | |||
| JP2013164509A | 2013-08-22 |
Other References:
"Atomic Weights and Isotopic Compositions for All Elements", NIST, 20 January 2017 (2017-01-20), XP055532209, Retrieved from the Internet [retrieved on 20170417]
THE CHEMICAL DAILY, 1 February 2016 (2016-02-01)
ACS NANO, vol. 4, no. 8, pages 4815 - 4823
See also references of EP 3435157A4
THE CHEMICAL DAILY, 1 February 2016 (2016-02-01)
ACS NANO, vol. 4, no. 8, pages 4815 - 4823
See also references of EP 3435157A4
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (JP)
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