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Title:
ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR FORMING POSITIVE-WORKING PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2022/172597
Kind Code:
A1
Abstract:
Provided is an active-ray-sensitive or radiation-sensitive resin composition which has excellent long-term stability and enables the formation of a pattern having excellently reduced LWR. Also provided are a resist film, a method for forming a positive-working pattern, and a method for manufacturing an electronic device, each of which is associated with the active-ray-sensitive or radiation-sensitive resin composition.　The active-ray-sensitive or radiation-sensitive resin composition comprises a resin (A) which has a repeating unit (a) and a basic compound of which a conjugate acid has a pKa value of 13.00 or less, in which the repeating unit (a) has a nonionic group from which a leaving group is detached therefrom upon the irradiation with an active ray or a radioactive ray to generate an acid, a repeating unit produced by substituting the leaving group by a hydrogen atom has a molecular weight of 300 or less, and the amount of the repeating unit (a) relative to the total solid content of the active-ray-sensitive or radiation-sensitive resin composition is a specified amount.

Inventors:
YAMAGUCHI SHUHEI (JP)
MIYOSHI TARO (JP)
Application Number:
PCT/JP2021/047008
Publication Date:
August 18, 2022
Filing Date:
December 20, 2021
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
C08F212/14; C08F220/38; C08F220/54; C08F228/02; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
WO2016158711A12016-10-06
WO2018193954A12018-10-25
WO2020004306A12020-01-02
WO2018019395A12018-02-01
Foreign References:
JP2011248019A2011-12-08
JP2012255845A2012-12-27
JP2013008022A2013-01-10
JP2011186341A2011-09-22
US20160070167A12016-03-10
US20150004544A12015-01-01
US20160237190A12016-08-18
US20160274458A12016-09-22
US20120135348A12012-05-31
US20150309408A12015-10-29
JP2014041328A2014-03-06
JP2013228681A2013-11-07
US20150004533A12015-01-01
JP2014059543A2014-04-03
JP2013061648A2013-04-04
Other References:
TERUO NAGAO: "Improvement of molecular surface area and volume calculation program", BULLETIN OF HAKODATE NATIONAL COLLEGE OF TECHNOLOGY, no. 27, 1993, pages 111 - 120
Attorney, Agent or Firm:
YONEKURA Junzo et al. (JP)
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