ADHESION LAYER COMPOSITION, METHOD FOR FORMING FILM BY NANOIMPRINTING, METHODS FOR MANUFACTURING OPTICAL COMPONENT, CIRCUIT BOARD AND ELECTRONIC APPARATUS

Title:

ADHESION LAYER COMPOSITION, METHOD FOR FORMING FILM BY NANOIMPRINTING, METHODS FOR MANUFACTURING OPTICAL COMPONENT, CIRCUIT BOARD AND ELECTRONIC APPARATUS

Document Type and Number:

WIPO Patent Application WO/2016/006190

Kind Code:

A1

Abstract:

In nanoimprinting processes, photo-cured products often separate from the substrate and stick to the mold due to insufficient adhesion between the photo-cured product and the substrate. This causes a defect of pattern separation. An adhesion layer composition used for forming an adhesion layer between a substrate and a photocurable composition includes a compound (A) having at least two functional groups, and a solvent (B). The functional groups include at least one functional group capable of being bound to the substrate, selected from the group consisting of hydroxy, carboxy, thiol, amino, epoxy, and (blocked) isocyanate, and at least one hydrogen donating group as a functional group capable of being bound to the photocurable composition.

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Inventors:

HONMA TAKESHI (JP)
ITO TOSHIKI (JP)
OTANI TOMONORI (JP)
SAKAMOTO KAZUMI (JP)

Application Number:

PCT/JP2015/003227

Publication Date:

January 14, 2016

Filing Date:

June 26, 2015

Export Citation:

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Assignee:

CANON KK (JP)

International Classes:

H01L21/027; B29C59/02; B32B27/00; C09J4/02; C09J11/06

Domestic Patent References:

WO2013191118A1	2013-12-27
WO2007119714A1	2007-10-25
WO2013047435A1	2013-04-04
WO2013191118A1	2013-12-27

Foreign References:

JP2013153084A	2013-08-08
US20120199997A1	2012-08-09
JPS55125631A	1980-09-27
JPH1069093A	1998-03-10
US20060210819A1	2006-09-21
JP2012078602A	2012-04-19
JP2010073811A	2010-04-02
JP2013153084A	2013-08-08

Other References:

ERIK C. HAGBERG ET AL., NANO LETTERS, vol. 7, no. 2, 1 February 2007 (2007-02-01), pages 233 - 237
See also references of EP 3158578A4

Attorney, Agent or Firm:

ABE, Takuma et al. (30-2Shimomaruko 3-chome, Ohta-k, Tokyo 01, JP)

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