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Title:
ADHESIVE COMPOSITION, AND CONNECTION STRUCTURE FOR CIRCUIT MEMBER
Document Type and Number:
WIPO Patent Application WO/2008/015852
Kind Code:
A1
Abstract:
An adhesion composition comprising (a) a thermoplastic resin, (b) a radically polymerizable compound having one or more fluorene structure in the molecule, and (c) a radical polymerization initiator.

Inventors:
IZAWA HIROYUKI (JP)
SHIRASAKA TOSHIAKI (JP)
KUDOU SUNAO (JP)
TOMIZAWA KEIKO (JP)
KATOGI SHIGEKI (JP)
Application Number:
PCT/JP2007/062585
Publication Date:
February 07, 2008
Filing Date:
June 22, 2007
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD (JP)
IZAWA HIROYUKI (JP)
SHIRASAKA TOSHIAKI (JP)
KUDOU SUNAO (JP)
TOMIZAWA KEIKO (JP)
KATOGI SHIGEKI (JP)
International Classes:
C09J4/00; C09J129/14; C09J133/00; C09J167/00; C09J171/10; C09J175/04; C09J179/08; H01B1/22; H01L21/60; H05K1/03; H05K3/32
Foreign References:
JP2005187661A2005-07-14
JP2004339499A2004-12-02
JP2005123025A2005-05-12
JP2005054140A2005-03-03
JP2003089775A2003-03-28
JP2002337274A2002-11-27
JPH1067970A1998-03-10
JPH01113480A1989-05-02
JP2002203427A2002-07-19
JP3522634B22004-04-26
JP2002285128A2002-10-03
Other References:
See also references of EP 2048209A4
J.P. FOUASSIER: "Photoinitiation, Photopolymerization, and Photocuring", 1995, HANSER PUBLISHERS, pages: 17
Attorney, Agent or Firm:
HASEGAWA, Yoshiki et al. (Ginza First Bldg.10-6, Ginza 1-chom, Chuo-ku Tokyo, JP)
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