ADJUSTABLE RESONATOR AND MANUFACTURING METHOD THEREFOR

WIPO Patent Application WO/2022/017486

A1

An adjustable resonator and a manufacturing method therefor. The resonator comprises: resonant cavities in a substrate, the resonant cavities at least including a central first resonant cavity and a peripheral second resonant cavity; a first stacked structure arranged on the first resonant cavity, and sequentially comprising a first portion of a lower electrode, a first portion of a piezoelectric layer, and a first portion of an upper electrode; a second stacked structure arranged on the second resonant cavity, and sequentially comprising a second portion of the lower electrode, a second portion of the piezoelectric layer, and a second portion of the upper electrode; and a first insulating layer disposed on the substrate and located between the first portion of the lower electrode and the second portion of the lower electrode. According to the adjustable resonator and the manufacturing method therefor of the present invention, an additional secondary resonator is arranged at the periphery of a primary resonator to actively adjust a resonant state, thereby facilitating increasing a level of integration and efficiency of a device.

WU MING (CN)
TANG ZHAOYUN (CN)
LAI ZHIGUO (CN)
YANG QINGHUA (CN)
WANG JIAYOU (CN)

PCT/CN2021/108055

January 27, 2022

July 23, 2021

Click for automatic bibliography generation  

SUZHOU HUNTERSUN ELECTRONICS CO LTD (CN)

H03H3/02; H03B5/32; H03H9/17

CN101069344A	2007-11-07
US4870313A	1989-09-26
US4529904A	1985-07-16
CN111786636A	2020-10-16
US20030001689A1	2003-01-02
CN105339297A	2016-02-17
US7408429B2	2008-08-05

FAIRSKY LAW OFFICE (CN)

View/Download PDF      PDF Help

Previous Patent: ROBOTIC ARM CONTROL METHOD AND SKIN SURFACE TREATMENT DEVICE

Next Patent: TGF-β RII MUTANT AND FUSION PROTEIN THEREOF