Title:
ADJUSTING DEVICE AND ADJUSTING METHOD FOR EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/066076
Kind Code:
A1
Abstract:
Provided is an adjusting device, which is an optical system with a light incident surface (341, 381, 171) and a light emergent surface (312, 352, 132) being a pair of parallel planes and is placed in an exposure device. The adjusting device (3) comprises at least one wedged lens (34, 38, 17, 13) and a plurality of optical lenses (31, 32, 33, 35, 36, 37, 14, 15, 16), and is used for adjusting at least one of the focal plane, multiplying power and location of a corresponding field of view of the exposure device by adjusting the relative locations of at least one pair of adjacent lenses. Also provided is an adjusting method corresponding to the adjusting device, and used for adjusting the focal plane, multiplying power and location of a corresponding field of view of the exposure device.
Inventors:
SUN JINGLU (CN)
Application Number:
PCT/CN2015/092900
Publication Date:
May 06, 2016
Filing Date:
October 27, 2015
Export Citation:
Assignee:
SHANGHAI MICROELECTRONICS EQUI (CN)
International Classes:
G03F7/20; G02B15/00
Foreign References:
| CN103364963A | 2013-10-23 | |||
| CN1452017A | 2003-10-29 | |||
| CN101551508A | 2009-10-07 | |||
| JP2010039347A | 2010-02-18 |
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
上海思微知识产权代理事务所（普通合伙） (CN)
上海思微知识产权代理事务所（普通合伙） (CN)
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